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Method and apparatus for optically measuring the thickness of an object being machined by interferometry

机译:用于光学测量通过干涉测量法加工的物体的厚度的方法和设备

摘要

A method for optically checking by interferometry the thickness of an object (2) being machined comprises a phase of direct checking wherein the spectrum of the result of interference between primary reflected radiations (R1) generated by reflection of incident radiations (I) on an external surface (16) and secondary reflected radiations (R2) generated by reflection on an internal surface of discontinuity (17) of the object is analyzed, and a preliminary phase wherein information relative to the variation of a virtual thickness (D) delimited and defined by a reference surface (18) and the external surface of the object, indicative of thickness variations of the object being machined. In the preliminary phase, the processing is based on the analysis of the spectrum of the result of interference between primary reflected radiations and reference reflected radiations (Rref) generated by the reflection of the incident radiations on the reference surface, that defines the length of a reference optical path. An apparatus that implements such method for optically checking includes an optical probe (6) that receives and detects the primary, secondary and reference reflected radiations, and a spectrometer (5) that analyzes the spectrum of the result of interference.
机译:通过干涉法光学检查被加工的物体(2)的厚度的方法包括直接检查的阶段,其中通过入射辐射(I)在外部的反射产生的一次反射辐射(R1)之间的干涉结果的光谱分析在物体的不连续性(17)的内表面上反射产生的第二表面(16)和二次反射辐射(R2),以及一个初步阶段,其中与虚拟厚度(D)变化有关的信息由以下元素界定和定义基准表面(18)和物体的外表面,指示要加工的物体的厚度变化。在初步阶段,该处理基于对主反射辐射和参考反射辐射(Rref)之间的干涉结果光谱的分析,该反射光谱是由入射辐射在参考表面上的反射生成的,定义了参考光路。实现这种用于光学检查的方法的设备包括:光学探头(6),其接收并检测一次,二次和参考反射辐射;以及光谱仪(5),其分析干涉结果的光谱。

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