An enhanced digital light processing-based mask projection stereolithography method and apparatus are disclosed, where the apparatus comprises: a control platform capable of slicing a model of a to-be-prototyped object into layers, converting the layer into a bitmap, and further dividing the layer into a main body area and boundary filling areas; a digital light processing unit that is controlled by the control platform and capable of emitting a first light beam used for the corresponding main body area of the layer of the to-be-prototyped object; and a laser marking unit that is controlled by the control platform and capable of emitting a second light beam used for the corresponding boundary filling areas of the layer of the to-be-prototyped object. The present invention can not only implement high-speed prototyping but also avoid an edge distortion, thereby improving precision of object prototyping.
展开▼
