首页> 外国专利> Gated bipolar junction transistors, memory arrays, and methods of forming gated bipolar junction transistors

Gated bipolar junction transistors, memory arrays, and methods of forming gated bipolar junction transistors

机译:门控双极结型晶体管,存储器阵列以及形成栅极双极结型晶体管的方法

摘要

Some embodiments include gated bipolar junction transistors. The transistors may include a base region between a collector region and an emitter region; with a B-C junction being at an interface of the base region and the collector region, and with a B-E junction being at an interface of the base region and the emitter region. The transistors may include material having a bandgap of at least 1.2 eV within one or more of the base, emitter and collector regions. The gated transistors may include a gate along the base region and spaced from the base region by dielectric material, with the gate not overlapping either the B-C junction or the B-E junction. Some embodiments include memory arrays containing gated bipolar junction transistors. Some embodiments include methods of forming gated bipolar junction transistors.
机译:一些实施例包括门控双极结型晶体管。所述晶体管可以包括在集电极区和发射极区之间的基极区;和B-C结在基极区和集电极区的界面处,而B-E结在基极区和发射极区的界面处。所述晶体管可包含在基极,发射极和集电极区域中的一者或一者以上具有至少1.2eV的带隙的材料。选通的晶体管可以包括沿着基极区域并且通过介电材料与基极区域隔开的栅极,该栅极不与B-C结或B-E结重叠。一些实施例包括包含门控双极结型晶体管的存储器阵列。一些实施例包括形成栅双极结型晶体管的方法。

著录项

  • 公开/公告号US10373956B2

    专利类型

  • 公开/公告日2019-08-06

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201514613876

  • 申请日2015-02-04

  • 分类号H01L29/74;H01L27/102;H01L29/73;H01L29/735;H01L21/02;H01L21/8229;H01L29/16;H01L29/732;H01L29/739;H01L27/108;H01L29/78;

  • 国家 US

  • 入库时间 2022-08-21 12:13:49

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号