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Thin film encapsulation layer manufacturing apparatus and method of manufacturing display apparatus using the same
Thin film encapsulation layer manufacturing apparatus and method of manufacturing display apparatus using the same
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机译:薄膜封装层制造设备以及使用该薄膜封装层制造设备的显示设备的方法
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摘要
A thin film encapsulation layer manufacturing apparatus is provided that may include a transfer chamber, a sputtering chamber, a monomer deposition chamber, a chemical vapor deposition (CVD) chamber, and an atomic layer deposition (ALD) chamber. The transfer chamber may be connected to each of the other chambers, and may be configured to align a substrate. Each of the other chambers may be configured to receive from and transfer to the transfer chamber a substrate. The sputtering chamber may be configured to form a first inorganic layer on the substrate by a sputtering process. The monomer deposition chamber may be configured to deposit a first organic layer on the first inorganic layer. The CVD chamber may be configured to form a second inorganic layer on the first organic layer. The ALD chamber may be configured to form a third inorganic layer on the second inorganic layer.
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