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Method for the fabrication of electron field emission devices including carbon nanotube electron field emission devices

机译:包括碳纳米管电子场致发射器件的电子场致发射器件的制造方法

摘要

The present invention is directed to a method for the fabrication of electron field emitter devices, including carbon nanotube (CNT) field emission devices. The method of the present invention involves depositing one or more electrically conductive thin-film layers onto a electrically conductive substrate and performing lithography and etching on these thin film layers to pattern them into the desired shapes. The top-most layer may be of a material type that acts as a catalyst for the growth of single- or multiple-walled carbon nanotubes (CNTs). Subsequently, the substrate is etched to form a high-aspect ratio post or pillar structure onto which the previously patterned thin film layers are positioned. Carbon nanotubes may be grown on the catalyst material layer. The present invention also described methods by which the individual field emission devices may be singulated into individual die from a substrate.
机译:本发明涉及一种用于制造包括碳纳米管(CNT)场发射器件的电子场发射器件的方法。本发明的方法包括将一个或多个导电薄膜层沉积到导电基底上,并进行光刻和蚀刻在这些薄膜层上以将它们图案化为期望的形状。最顶层可以是充当单壁或多壁碳纳米管(CNT)生长的催化剂的材料类型。随后,蚀刻衬底以形成高纵横比的柱或柱结构,先前构图的薄膜层位于其上。碳纳米管可以生长在催化剂材料层上。本发明还描述了方法,通过该方法可以将各个场致发射器件从衬底分离为单个管芯。

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