首页> 外国专利> Method of forming a substrate core structure using microvia laser drilling and conductive layer pre-patterning and substrate core structure formed according to the method

Method of forming a substrate core structure using microvia laser drilling and conductive layer pre-patterning and substrate core structure formed according to the method

机译:使用微孔激光钻孔和导电层预图案形成基板芯结构的方法以及根据该方法形成的基板芯结构

摘要

A method of fabricating a substrate core structure comprises: providing first and second patterned conductive layers defining openings therein on each side of a starting insulating layer; providing a first and a second supplemental insulating layers onto respective ones of a first and a second patterned conductive layer; laser drilling a set of via openings extending through at least some of the conductive layer openings of the first and second patterned conductive layers; filling the set of via openings with a conductive material to provide a set of conductive vias; and providing a first and a second supplemental patterned conductive layer onto respective ones of the first and the second supplemental insulating layers, the set of conductive vias contacting the first supplemental patterned conductive layer at one side thereof, and the second supplemental patterned conductive layer at another side thereof.
机译:一种制造基板芯结构的方法,包括:在第一绝缘层的每一侧上提供第一和第二图案化导电层,所述第一和第二图案化导电层在其中限定开口。在第一和第二图案化导电层上分别提供第一和第二辅助绝缘层;激光打孔一组通孔,该通孔延伸穿过第一和第二图案化导电层的至少一些导电层开口;用导电材料填充该组通孔开口以提供一组导电通孔;在第一和第二辅助绝缘层中的相应一个上提供第一和第二辅助图案化导电层,该组导电通孔在其一侧与第一辅助图案化导电层接触,并且在另一侧接触第二辅助图案化导电层。侧面。

著录项

  • 公开/公告号US10306760B2

    专利类型

  • 公开/公告日2019-05-28

    原文格式PDF

  • 申请/专利权人 INTEL CORPORATION;

    申请/专利号US201715497156

  • 申请日2017-04-25

  • 分类号H05K1/11;H05K3;H05K3/42;H05K3/46;H05K1/02;H05K1/03;H05K1/18;

  • 国家 US

  • 入库时间 2022-08-21 12:13:10

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