首页> 外国专利> Ferroelectric Field Effect Transistors, Pluralities Of Ferroelectric Field Effect Transistors Arrayed In Row Lines And Column Lines, And Methods Of Forming A Plurality Of Ferroelectric Field Effect Transistors

Ferroelectric Field Effect Transistors, Pluralities Of Ferroelectric Field Effect Transistors Arrayed In Row Lines And Column Lines, And Methods Of Forming A Plurality Of Ferroelectric Field Effect Transistors

机译:铁电场效应晶体管,排列成行线和列线的多个铁电场效应晶体管,以及形成多个铁电场效应晶体管的方法

摘要

A ferroelectric field effect transistor comprises a semiconductive channel comprising opposing sidewalls and an elevationally outermost top. A source/drain region is at opposite ends of the channel. A gate construction of the transistor comprises inner dielectric extending along the channel top and laterally along the channel sidewalk. Inner conductive material is elevationally and laterally outward of the inner dielectric and extends along the channel top and laterally along the channel sidewalk. Outer ferroelectric material is elevationally outward of the inner conductive material and extends along the channel top. Outer conductive material is elevationally outward of the outer ferroelectric material and extends along the channel. Other constructions and methods are disclosed.
机译:铁电场效应晶体管包括半导体沟道,该半导体沟道包括相对的侧壁和高度最靠外的顶部。源极/漏极区在沟道的相对端。晶体管的栅极构造包括内部电介质,该内部电介质沿着沟道顶部并且沿着沟道人行道横向地延伸。内部导电材料在内部电介质的高度和横向外侧,并沿着通道顶部和横向沿着通道人行道延伸。外部铁电材料垂直于内部导电材料向外并沿着通道顶部延伸。外部导电材料垂直于外部铁电材料向外并且沿着通道延伸。公开了其他构造和方法。

著录项

  • 公开/公告号US2018358472A1

    专利类型

  • 公开/公告日2018-12-13

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201816106626

  • 申请日2018-08-21

  • 分类号H01L29/78;H01L29/66;H01L27/085;H01L27/1159;

  • 国家 US

  • 入库时间 2022-08-21 12:11:16

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