INCREASING THICKNESS OF FUNCTIONAL LAYER ACCORDING TO INCREASING RECESS AREA

摘要

A semiconductor device includes a semiconductor substrate having first and second semiconductor fins, an insulating layer on the semiconductor substrate, the insulating layer including a first recess exposing an upper portion of the first semiconductor fin and a second recess exposing an upper portion of the second semiconductor fin, a gate dielectric layer on the first and second recesses and the exposed upper portions of the first and second semiconductor fins, a first work function adjustment layer on the gate dielectric layer, a functional layer on the first function adjustment layer, and first and second gates on portions of the functional layer of the respective first and second semiconductor fins. The surface area of a lateral opening of the first recess is larger than the surface area of a lateral opening of the second recess.