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High mobility transport layer structures for rhombohedral Si/Ge/SiGe devices
High mobility transport layer structures for rhombohedral Si/Ge/SiGe devices
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机译:用于菱形Si / Ge / SiGe器件的高迁移率传输层结构
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摘要
An electronic device includes a trigonal crystal substrate defining a (0001) C-plane. The substrate may comprise Sapphire or other suitable material. A plurality of rhombohedrally aligned SiGe (111)-oriented crystals are disposed on the (0001) C-plane of the crystal substrate. A first region of material is disposed on the rhombohedrally aligned SiGe layer. The first region comprises an intrinsic or doped Si, Ge, or SiGe layer. The first region can be layered between two secondary regions comprising n+doped SiGe or n+doped Ge, whereby the first region collects electrons from the two secondary regions.
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