首页> 外国专利> PSEUDO-CONDUCTIVE HIGH-ELECTRON MOBILITY TRANSISTORS AND MICROELECTRONIC SENSORS BASED ON THEM

PSEUDO-CONDUCTIVE HIGH-ELECTRON MOBILITY TRANSISTORS AND MICROELECTRONIC SENSORS BASED ON THEM

机译:基于伪导电性的高电子迁移率晶体管和微电子传感器

摘要

n some embodiments, an open-gate pseudo-conductive high-electron mobility transistor (PC-HEMT) includes a multilayer hetero-junction structure made of III-V single-crystalline or polycrystalline semiconductor materials. This structure includes at least one buffer layer and a barrier layer, and is deposited on a substrate layer. The PC-HEMT further includes a two-dimensional electron gas (2DEG) or two-dimensional hole gas (2DHG) conducting channel formed at the interface between the buffer layer and the barrier layer, source and drain contacts, either ohmic or non-ohmic, connected to the 2DEG or 2DHG conducting channel, electrical metallizations for connecting the PC-HEMT to an electric circuit, and an open gate area between the source and drain contacts. Some embodiments use non-ohmic contacts, have thickness of the top (buffer or barrier) layer in the open gate area in the range of 5-9 nm, which corresponds to the pseudo-conducting current range between normally-on and normally-off operation mode of the transistor, and have the roughness of the surface barrier layer in the range of about 0.2 nm or less.
机译:在一些实施例中,开栅伪导电高电子迁移率晶体管(PC-HEMT)包括由III-V单晶或多晶半导体材料制成的多层异质结结构。该结构包括至少一个缓冲层和阻挡层,并沉积在衬底层上。 PC-HEMT还包括在缓冲层和势垒层之间的界面处形成的二维电子气(2DEG)或二维空穴气(2DHG)导电沟道,欧姆或非欧姆的源极和漏极触点连接到2DEG或2DHG导电通道,用于将PC-HEMT连接到电路的电气金属层以及源极和漏极触点之间的开栅区域。一些实施例使用非欧姆接触,在开栅区域中的顶层(缓冲层或势垒)的厚度在5-9nm的范围内,其对应于常开和常关之间的伪导电电流范围。晶体管的工作模式,并且表面势垒层的粗糙度在约0.2nm或更小范围内。

著录项

  • 公开/公告号US2019021622A1

    专利类型

  • 公开/公告日2019-01-24

    原文格式PDF

  • 申请/专利权人 EPITRONIC HOLDINGS PTE LTD.;

    申请/专利号US201816122032

  • 发明设计人 AYAL RAM;AMIR LICHTENSTEIN;

    申请日2018-09-05

  • 分类号A61B5/0408;H01L29/778;H01L29/205;H01L29/20;A61B7/04;A61B5/11;A61B5/0478;A61B1/273;A61B5/0452;A61B5/04;A61B5/021;A61B5/00;A61B3/16;A61B5/08;

  • 国家 US

  • 入库时间 2022-08-21 12:06:51

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号