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GROUP 5 METAL COMPOUND, METHOD FOR PREPARING THE SAME, PRECURSOR COMPOSITION FOR DEPOSITING LAYER CONTAINING THE SAME, AND METHOD FOR DEPOSITING LAYER USING THE SAME
GROUP 5 METAL COMPOUND, METHOD FOR PREPARING THE SAME, PRECURSOR COMPOSITION FOR DEPOSITING LAYER CONTAINING THE SAME, AND METHOD FOR DEPOSITING LAYER USING THE SAME
The present disclosure relates to a novel Group 5 metal compound, a method for preparing the Group 5 metal compound, a precursor composition for depositing a Group 5 metal-containing layer containing the Group 5 metal compound, and a method for depositing a Group 5 metal-containing layer using the precursor composition for depositing a Group 5 metal-containing layer.
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