首页> 外国专利> FILM OF QUANTUM DOT, METHOD FOR PATTERNING THE SAME AND QUANTUM DOT LIGHT EMITTING DEVICE USING THE SAME

FILM OF QUANTUM DOT, METHOD FOR PATTERNING THE SAME AND QUANTUM DOT LIGHT EMITTING DEVICE USING THE SAME

机译:量子点膜,其图案化方法及使用该膜的量子点发光装置

摘要

The present disclosure provides a quantum dot thin film that is formed by cross-linking ligands of quantum dots with a photo cross-linker containing two or more azide groups. According to still another aspect of the present disclosure, a method for forming a quantum dot pattern includes: forming a quantum dot layer on a substrate by coating the substrate with a solution including quantum dots and a photo cross-linker containing two or more azide groups; placing a mask having a pattern on the quantum dot layer and performing UV exposure on the quantum dot layer; and forming a quantum dot pattern by removing a non-exposed region of the quantum dot layer.
机译:本公开提供了一种量子点薄膜,其通过将量子点的配体与包含两个或更多个叠氮化物基团的光交联剂交联而形成。根据本公开的又一方面,一种用于形成量子点图案的方法包括:通过用包括量子点和包含两个或更多个叠氮化物基团的光交联剂的溶液涂覆基板在基板上形成量子点层。 ;在量子点层上放置具有图案的掩模,并在量子点层上进行UV曝光;通过去除量子点层的非暴露区域来形成量子点图案。

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