首页> 外国专利> A METHOD OF DEPOSITING A TIN LAYER ON A METAL SUBSTRATE AND A USE OF A STRUCTURE COMPRISING A NICKEL/PHOSPHOROUS ALLOY UNDERLAYER AND SAID TIN LAYER WITH SAID METHOD

A METHOD OF DEPOSITING A TIN LAYER ON A METAL SUBSTRATE AND A USE OF A STRUCTURE COMPRISING A NICKEL/PHOSPHOROUS ALLOY UNDERLAYER AND SAID TIN LAYER WITH SAID METHOD

机译:一种在金属基体上沉积锡层的方法以及采用SAID方法的包含镍/磷合金基底和所述锡层的结构的使用

摘要

To achieve tin deposits being largely free of pressure induced whiskers, a method of depositing a tin layer on a metal substrate is devised, wherein said method comprises: (a) providing said metal substrate; (b) depositing a nickel/phosphorous alloy underlayer on at least one surface of said metal substrate; and (c) depositing said tin layer on said nickel/phosphorous alloy underlayer by depositing said tin layer comprising using a pulse plating method.
机译:为了获得基本上没有压力引起的晶须的锡沉积物,设计了一种在金属基底上沉积锡层的方法,其中所述方法包括:(a)提供所述金属基底; (b)在所述金属基材的至少一个表面上沉积镍/磷合金底层; (c)通过使用脉冲电镀法沉积所述锡层在所述镍/磷合金底层上沉积所述锡层。

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