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Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus
Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus
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机译:用于控制向处理室的气体供应的方法,用于控制向处理室的气体供应的控制器和装置
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摘要
A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.
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