Charged particle source module, an exposure system with said charged particle source module, a method for manufacturing a semiconductor device and a method for inspecting a target

摘要

The invention relates to a charged particle source module for generating and emitting a charged particle beamq such as an electron beamq comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged. particle beamq such. as an electron. beamq wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.