Method for filtering particulates in a physical vapor deposition by cathode arc (PVD), in vacuum

摘要

A method to filter macro particles in a cathodic arc physical vapor deposition (PVD) in vacuum is described, said method comprising the step of evaporating a material from a solid source (1) by means of application of the arc on the source, forming a plasma comprising electrons, micro particles (vapor) and ions of evaporated material, together with macro particles larger in size than the micro particles and ions. The arc is moved on the source at a speed Vcs (superficial speed) at which the electrons, the micro particles and the ions of material evaporated at a point P2 deviate, from a path towards a substrate (2) to be coated facing the source, the macro particles formed at a point P1 previously passed over by the arc, so as to self-clean the plasma of the macro particles and allow condensation of only the cleaned plasma on the substrate.