METHOD BY WHICH DIGITAL MICROMIRROR DEVICE CONTROLLER FOR HIGH-SPEED EXPOSURE OF FINE LINE WIDTH CONTROLS EXPOSURE IMAGE OUTPUT

摘要

An embodiment relates to a method by which a digital micromirror device (DMD) controller for high-speed exposure of a fine line width controls an exposure image output, the method performing outputting in a virtual frame, in which an exposure image is rotated at an angle between the DMD and a moving direction of the stage, on a stage or mask film virtualized by performing modeling in a memory cell according to an exposure image resolution when a DMD is tilted or a stage is moved with a high-speed mechanism while tilted, and thus a finer line width is implemented than when exposure proceeds by moving a stage at a predetermined slope according to one embodiment without tilting the DMD and with the DMD in parallel as in a conventional method.