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PHASE MODULATOR AND FABRICATION METHOD THEREFOR, AND SILICON-SUBSTRATE ELECTRO-OPTIC MODULATOR

机译:相位调制器及其制造方法,以及硅基光电调制器

摘要

A phase modulator and a fabrication method therefor, and a silicon-substrate electro-optic modulator. A P-type doped region (2) is divided by the phase modulator into a first P-type doped region (21) and a second P-type doped region (22); an N-type doped region (3) is divided into a first N-type doped region (31) and a second N-type doped region (32), wherein the doping concentration of the second P-type doped region (22) is smaller than that of the first P-type doped region (21), and the doping concentration of the second N-type doped region (32) is smaller than that of the first N-type doped region (31), thus achieving good electrical contact between the phase modulator and a driving circuit by using the heavy doping concentrations of the first P-type doped region (21) and the first N-type doped region (31), as well as reducing the doping concentration of the P-type doped region (2) at one side close to a PN junction structure (1) by using the second P-type doped region (22), reducing the doping concentration of the N-type doped region (3) at one side close to the PN junction structure (1) by using the second N-type doped region (32), and reducing the optical transmission loss of the phase modulator, thereby reducing the optical transmission loss of the silicon-substrate electro-optic modulator.
机译:相位调制器及其制造方法,以及硅基板电光调制器。通过相位调制器将P型掺杂区域(2)分为第一P型掺杂区域(21)和第二P型掺杂区域(22); N型掺杂区(3)分为第一N型掺杂区(31)和第二N型掺杂区(32),其中第二P型掺杂区(22)的掺杂浓度为小于第一P型掺杂区(21)的掺杂浓度,并且第二N型掺杂区(32)的掺杂浓度小于第一N型掺杂区(31)的掺杂浓度,从而获得良好的电学性能通过使用第一P型掺杂区(21)和第一N型掺杂区(31)的重掺杂浓度,使相位调制器和驱动电路之间的接触,以及降低P型掺杂浓度通过使用第二P型掺杂区(22)在靠近PN结结构(1)的一侧的掺杂区(2)中,降低了靠近PN结结构(1)的一侧的N型掺杂区(3)的掺杂浓度。通过使用第二N型掺杂区(32)来实现PN结结构(1),并减少相位调制器的光传输损耗,从而降低硅衬底电光调制器的光传输损耗。

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