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Design, Fabrication and Optimization of Silicon Electro-optic Modulators for Digital and Analog Applications.

机译:用于数字和模拟应用的硅电光调制器的设计,制造和优化。

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摘要

Silicon optical interconnects have received tremendous attentions in recent years due to their properties of high bandwidth and low power consumption. In many applications, the optical interconnect is considered as a practical solution to replace the conventional copper line based electrical interconnects for improved performance in handling jitter and bandwidth advantage. The electro-optic (EO) modulator on silicon substrate is one of the most important building blocks in constructing complementary metal-oxide-semiconductor (CMOS) compatible optical interconnects. Crystalline silicon has very weak first-order linear EO effect, and therefore free carrier plasma effect is often used to manipulate the optical refractive index of silicon. This work focuses on design, fabrication, and optimization of silicon EO modulators for both digital and analog applications. SiGe heterojunction bipolar transistors (HBTs) are high-speed electronic devices and compatible with CMOS technology. In my thesis work, the SiGe HBT structure is modified to work as an EO modulator to achieve better optical modulation efficiency. Different design trade-offs are discussed in details and three different HBT models are developed. A modulation efficiency of L pi∣Vpi = 0.00198V∣cm is achieved by adding germanium into the collector region. In addition, the linearity of SiGe HBT EO modulator is evaluated for potential analog applications. A 96 dB∣Hz2/3 dynamic range is achieved for a HBT modulator. The fabrication of SiGe HBTs in cleanroom is explored using electron beam lithography and key fabrication steps are discussed. Two new device structures are explored theoretically. The tunneling modulator structure uses tunneling layers to cascade PiNs in a silicon rib waveguide. Compared with conventional PiN modulators, the proposed tunneling modulator has reduced diffusion capacitance and does not suffer from sub-wavelength confinement problem. The other new structure explored in this work is a super junction EO modulator, which utilizes super junction structure to increase the doping level without compromising the breakdown voltage. For the designed super junction modulator, the heavily-doped device can be fully depleted with a small voltage swing, which greatly improves optical modulation efficiency. Device modeling analysis predicts that the modulation efficiency of the super junction EO modulator is ~ 20 times higher compared with the state-of-the-art depletion-type Si EO modulators.
机译:硅光互连件由于其高带宽和低功耗的特性,近年来受到了极大的关注。在许多应用中,光学互连被认为是替代传统的基于铜线的电气互连的实用解决方案,以提高处理抖动和带宽优势的性能。硅基板上的电光(EO)调制器是构建互补金属氧化物半导体(CMOS)兼容的光学互连中最重要的组成部分之一。结晶硅具有非常弱的一阶线性EO效应,因此,自由载流子等离子体效应通常用于控制硅的光学折射率。这项工作专注于针对数字和模拟应用的硅EO调制器的设计,制造和优化。 SiGe异质结双极晶体管(HBT)是高速电子设备,并且与CMOS技术兼容。在我的论文工作中,对SiGe HBT结构进行了修改以用作EO调制器,以实现更好的光调制效率。详细讨论了不同的设计折衷,并开发了三种不同的HBT模型。通过将锗添加到集电极区域中来实现L pi∣ Vpi = 0.00198V&cm; cm的调制效率。此外,还针对潜在的模拟应用评估了SiGe HBT EO调制器的线性度。对于HBT调制器,可实现96 dB&Hz2 / 3的动态范围。利用电子束光刻技术探索了洁净室中SiGe HBT的制备方法,并讨论了关键的制备步骤。理论上探索了两种新的器件结构。隧道调制器结构使用隧道层在硅肋波导中级联PiN。与传统的PiN调制器相比,所提出的隧穿调制器具有减小的扩散电容,并且没有子波长限制问题。在这项工作中探索的另一个新结构是超级结EO调制器,它利用超级结结构在不影响击穿电压的情况下增加了掺杂水平。对于设计的超级结调制器,可以以较小的电压摆幅完全耗尽重掺杂器件,从而大大提高了光调制效率。器件建模分析预测,与最新的耗尽型Si EO调制器相比,超结EO调制器的调制效率高约20倍。

著录项

  • 作者

    Wu, Pengfei.;

  • 作者单位

    Rensselaer Polytechnic Institute.;

  • 授予单位 Rensselaer Polytechnic Institute.;
  • 学科 Electrical engineering.;Optics.
  • 学位 Ph.D.
  • 年度 2014
  • 页码 135 p.
  • 总页数 135
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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