首页>
外国专利>
NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS
NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS
展开▼
机译:高选择性锡-锡CMP应用的氮化物抑制剂
展开▼
页面导航
摘要
著录项
相似文献
摘要
The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, b) a removal rate inhibitor selected from (I) a surfactant comprising a polyoxyalkylene functional group and a sulfonate functional group, (II) a surfactant comprising a polyoxyalkylene functional group and a sulfate functional group, (III) a first surfactant comprising a polyoxyalkylene functional group and a second surfactant comprising a sulfonate functional group, and (IV) a first surfactant comprising a polyoxyalkylene functional group and a second surfactant comprising a sulfate functional group, and (c) an aqueous carrier. The invention also provides a method of chemically-mechanically polishing a substrate comprising TiN and SiN with the inventive chemical-mechanical polishing composition.
展开▼