HIGH-REFRACTIVE INDEX SILICON HYDRIDE THIN FILM, PREPARATION METHOD THEREFOR, FILTER STACK, AND OPTICAL FILTER

摘要

A high-refractive index silicon hydride thin film, a preparation method therefor, a filter stack, and an optical filter, relating to the field of thin-film optics. The preparation method comprises the steps of: (a) depositing Si on a substrate by means of magnetron Si sputtering to form a silicon thin film; (b) exposing the silicon thin film to an environment containing reactive hydrogen and reactive oxygen to form an oxygen-containing silicon hydride thin film, wherein the quantity of reactive oxygen species accounts for 4% to 99% of the total quantity of reactive hydrogen and reactive oxygen species, or alternatively, exposing the silicon thin film in an environment containing reactive hydrogen and reactive nitrogen to form a nitrogen-containing thin film, wherein the quantity of reactive nitrogen species accounts for 5% to 20% of the total quantity of reactive hydrogen and reactive nitrogen species. The preparation method conducts sputtering and reaction steps separately, first depositing Si on a substrate by means of magnetron Si sputtering before reacting a reactive hydrogen and reactive oxygen/nitrogen plasma with the silicon to obtain SiH containing oxygen or nitrogen. Not only does this avoid target poisoning, but the SiH thin films thus prepared have a high refractive index and low absorptance.