IMMERSION LENS ARRAY FOR THE PATTERNING OF PHOTORESIST BY MASKLESS LITHOGRAPHY

摘要

Self-aligned maskless photolithography using a contiguous immersion lens array is provided. This process is especially suitable for use in fabrication of perovskite solar cells. In these devices, the lens array can 1) lithographically define a mechanical support structure for the perovskite active material and 2) provide light concentration to the perovskite active material in operation.