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- - NON-POLISHED GLASS WAFER THINNING SYSTEM AND METHOD FOR USING THE NON-POLISHED GLASS WAFER TO THIN A SEMICONDUCTOR WAFER
- - NON-POLISHED GLASS WAFER THINNING SYSTEM AND METHOD FOR USING THE NON-POLISHED GLASS WAFER TO THIN A SEMICONDUCTOR WAFER
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机译:-非抛光玻璃晶片薄化系统和使用该非抛光玻璃晶片薄化半导体晶片的方法
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摘要
Non-abrasive glass wafers, thinning systems, and methods of using such non-abrasive glass wafers to thin semiconductor wafers are disclosed herein. In one embodiment, the glass wafer has a body (e.g., a circular body) comprising a non-abraded first surface and a non-abraded second surface that are substantially parallel to each other. Additionally, the circular body has a wafer quality index such as a change in the total thickness of the micrometer of less than 6.0 plus one-tenth of the deflection in micrometers.
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