首页> 外国专利> - - NON-POLISHED GLASS WAFER THINNING SYSTEM AND METHOD FOR USING THE NON-POLISHED GLASS WAFER TO THIN A SEMICONDUCTOR WAFER

- - NON-POLISHED GLASS WAFER THINNING SYSTEM AND METHOD FOR USING THE NON-POLISHED GLASS WAFER TO THIN A SEMICONDUCTOR WAFER

机译:-非抛光玻璃晶片薄化系统和使用该非抛光玻璃晶片薄化半导体晶片的方法

摘要

Non-abrasive glass wafers, thinning systems, and methods of using such non-abrasive glass wafers to thin semiconductor wafers are disclosed herein. In one embodiment, the glass wafer has a body (e.g., a circular body) comprising a non-abraded first surface and a non-abraded second surface that are substantially parallel to each other. Additionally, the circular body has a wafer quality index such as a change in the total thickness of the micrometer of less than 6.0 plus one-tenth of the deflection in micrometers.
机译:本文公开了非研磨玻璃晶片,减薄系统以及使用这种非研磨玻璃晶片来使半导体晶片变薄的方法。在一个实施例中,玻璃晶片具有主体(例如,圆形主体),该主体包括彼此基本平行的未研磨的第一表面和未研磨的第二表面。另外,圆形体具有晶片质量指数,例如,微米的总厚度的变化小于6.0加上以微米为单位的挠度的十分之一。

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