LINE WIDTH MEASURING SYSTEM AND LINE WIDTH MEASURING DEVICE

摘要

Disclosed is a line width measurement system used for measuring a graphic line width on a substrate surface, and comprising a line width measurement unit and a focal surface inspection and outline measurement unit. The focal surface inspection and outline measurement unit comprises a first measurement beam, and first and second detection modules. The first measurement beam is obliquely irradiated to the substrate surface to form a first reflective beam after being reflected on the substrate surface. The first detection module receives the first reflective beam to measure defocusing of the substrate surface and the second detection module receives the first reflective beam to measure a graphic outline of the substrate surface. The line width measurement unit includes a second measurement beam, and uses the focal surface inspection and outline measurement unit, and the second detection module in common. The second measurement beam is vertically irradiated to the substrate surface to form a second reflective beam after being reflected on the substrate surface. The second detection module receives the second reflective beam to measure the graphic line width on the substrate surface.