Alternative oxidant for cobalt CMP

摘要

The present invention provides a chemical-mechanical polishing composition comprising (a) an abrasive, (b) a cobalt promoter, and (c) an oxidizing agent for oxidizing the metal and having a pH of about 4 to about 10. [ The present invention also provides a method for chemically-mechanically polishing a substrate with a chemical-mechanical polishing composition of the present invention. Typically, the substrate contains cobalt.