ELECTROSTATIC CHUCK HAVING ETCHING PROCESS MONITORING AND SELF-MONITORING FUNCTION AND ETCHING PROCESS EQUIPMENT WITH SAME

摘要

An electrostatic chuck having an etching process monitoring and self-monitoring function includes: a support unit supporting a substrate; an electrostatic electrode provided on the support unit, supplied with electric power from an electrostatic chuck power supply unit to chuck and dechuck the substrate, and receiving a RF signal; a process monitoring circuit receiving the RF signal from the electrostatic electrode and measuring an electrical parameter included in the RF signal; and a control unit receiving the electrical parameter from the process monitoring circuit and monitoring an etching degree of the substrate and presence or absence of abnormality of the support unit based on the electrical parameter.;COPYRIGHT KIPO 2019