METHODS APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING TO A LITHOGRAPHIC MANUFACTURING PROCESS LITHOGRAPHIC PROCESSING SYSTEM INCLUDING DIAGNOSTIC APPARATUS

摘要

The diagnostic device monitors the lithographic fabrication system. First measurement data representing the local deviation of some of the characteristics across the substrate is obtained using the sensor 202 in the lithographic apparatus and / or a separate metrology tool 240. Other inspection tools 244 and 248 perform wafer backside inspection and / or reticle backside inspection to generate second measurement data 302. The high-resolution backside defect image is processed and is in a form that can be compared to the lower resolution information from the first measurement data. Cross-Correlation (CORR) is performed to identify which of the observed defects is spatially correlated with deviations represented in the first measurement data. A correlation map 506 is used to identify the potentially relevant clusters of defects in the more detailed original defect map 520. [ The resulting device may be identified by pattern recognition (PREC) as part of an automated root cause analysis.