Unique Chip Fabrication Using a Charged Particle Multi-Beamlet Lithography System

摘要

A method of manufacturing an electronic device using a maskless lithography exposure system using a maskless pattern writer is disclosed. The method exposes a wafer for generation of an electronic device, including generating beamlet control data for controlling a maskless pattern writer, the beamlet control data defining a selectable feature for individualizing the electronic device. And the exposure of the wafer according to the beamlet control data results in exposing a pattern having a different selection of features from the feature data set for different sub-sets of the electronic device.