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Sn Sn Sn ALLOY PLATING APPARATUS AND Sn ALLOY PLATING METHOD

机译:Sn Sn Sn合金镀覆装置及Sn合金镀覆方法

摘要

An object of the present invention is to provide a Sn alloy plating apparatus capable of easily adjusting the concentration of Sn ions in a plating solution. The Sn alloy plating apparatus includes a plating bath 1 for immersing the insoluble anode 2 and the substrate W in a Sn alloy plating solution and an anode chamber 66 in which the Sn anode 70 is disposed and a cathode chamber A pure water supply mechanism 102 for supplying pure water to the anode chamber 66 and the cathode chamber 68 and an anode chamber 66 for supplying pure water to the anode chamber 66 and the cathode chamber 68, A methane sulfonic acid solution supply mechanism 103 for supplying a methane sulfonic acid solution containing methane sulfonic acid to the cathode chamber 68 and an Sn replenishment solution containing Sn ion and methane sulfonic acid generated in the anode chamber 66, 1 to supply the Sn replenishment solution.
机译:本发明的目的是提供一种能够容易地调整镀液中的Sn离子浓度的Sn合金镀覆装置。 Sn合金镀敷装置包括:用于将不溶性阳极2和基板W浸渍在Sn合金镀敷溶液中的镀浴1;和配置有Sn阳极70的阳极室66;以及阴极室A。向阳极室66和阴极室68供应纯水,以及向阳极室66和阴极室68供应纯水的阳极室66,用于供应含甲烷的甲烷磺酸溶液的甲烷磺酸溶液供应机构103。阳极室66、1中向阴极室68中注入磺酸和包含Sn离子和甲烷磺酸的Sn补充溶液,以供给Sn补充溶液。

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