METHOD AND APPARATUS FOR CAD BASED INDUSTRIAL PLANT AND SEMICONDUCTOR FACILITY DESIGN

摘要

Disclosed are a method and an apparatus for designing an industrial plant and a semiconductor facility. According to an embodiment of the present invention, the apparatus for designing an industrial plant and a semiconductor facility identifies a type of a design target based on target information to be designed, acquires a structure design condition, a machine design condition, and a control design condition corresponding to the design target, checks a database matching design targets, structure design conditions, machine design conditions, control design conditions, and elements to acquire second elements corresponding to the structure design condition, the machine design condition, and the control design condition, generates position information of the second elements, connection information of connection relations between the second elements, and operation information of operation processes of the second elements based on design information optimized in accordance with a history of the design targets, the structure design conditions, the machine design conditions, and the control design conditions, generates a three dimensional model of an industrial plant or a semiconductor facility modeling the design target based on the position information, the connection information, and the operation information, and applies control signals corresponding to the structure design condition, the machine design condition, and the control design condition to the three dimensional model to test the three dimensional model.