LINE WIDTH MEASURING SYSTEM AND LINE WIDTH MEASURING DEVICE

摘要

The present invention discloses a line width measurement system, wherein the line width measurement system is used to measure a graphic line width of a substrate surface, and includes a line width measurement unit, a focal surface detection and contour measurement unit, The focal surface detection and contour measurement unit includes a first measurement beam, a first detection module and a second detection module, wherein the first measurement light beam is irradiated to the substrate surface in an inclined manner, to the substrate surface. After being reflected, a first reflected light beam is formed, the first reflected light beam is received from the first detection module to measure defocusing of the substrate surface, and the first reflected light beam is used as the second reflected light beam. Received from a detection module to measure a graphical contour of the substrate surface, the line width measuring unit including a second measuring luminous flux, and comprising an image with the focal surface detection and contour measuring unit Sharing a second detection module, wherein the second measurement light beam is incident vertically to the substrate surface and reflected by the substrate surface, thereby forming a second reflection light beam, and the second reflection light beam is the second detection light beam Received from the module, the graphic line width of the substrate surface is measured.