Method for correcting electronic proximity effects using Voigt scattering functions

摘要

The method involves correcting the effects of scattering in a beam. A point spread function which is a linear combination of functions chosen from a group comprising a Voigt function and a function approximating a Voigt function such as Pearson VII function is calculated. The linear combination of functions is provided with a Gaussian function. The parameters of functions which are included in linear combination and the coefficients of linear combination are selected. Independent claims are included for the following: (1) a computer program comprising program code instructions for projecting electron beam on wafer or mask; (2) an electron lithography system; (3) a system for simulating electron lithography process; and (4) an electron microscopy system.