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LINEARIZED ENERGETIC RADIO-FREQUENCY PLASMA ION SOURCE

机译:线性能量射频等离子体离子源

摘要

A plasma ion source includes a plasma chamber body having at least one inlet for introducing a feed gas to an interior of the plasma chamber body. The plasma chamber body is electrically isolated from a vacuum chamber attached to the plasma chamber body. An inductive antenna in an interior of the plasma chamber body is configured to supply a source of electromagnetic energy as a function of an RF voltage supplied thereto. The plasma ion source includes an extraction grid disposed at an end of the plasma chamber body. A voltage difference between the extraction grid and plasma chamber body accelerates charged species in a plasma discharge to generate an output quasi-neutral plasma ion beam. A bias voltage applied to the plasma chamber body includes a portion of the RF voltage supplied to the antenna combined with a pulsed DC voltage.
机译:等离子体离子源包括具有至少一个入口的等离子体室主体,该入口用于将进料气体引入到等离子体室主体的内部。等离子体室主体与附接到等离子体室主体的真空室电隔离。等离子体腔室主体的内部中的感应天线被配置为根据所供应的RF电压来供应电磁能源。等离子体离子源包括布置在等离子体室主体的端部处的提取栅格。提取栅极和等离子体腔室主体之间的电压差会加速等离子体放电中的带电物质,从而产生输出准中性等离子体离子束。施加到等离子体室主体的偏置电压包括提供给天线的一部分RF电压和脉冲DC电压。

著录项

  • 公开/公告号EP3711078A1

    专利类型

  • 公开/公告日2020-09-23

    原文格式PDF

  • 申请/专利权人 DENTON VACUUM LLC;

    申请/专利号EP20180876928

  • 发明设计人 OUTTEN CRAIG A.;

    申请日2018-11-13

  • 分类号H01J23/08;H01J37/32;H03K3/011;H05B6/72;H05H1/32;F28D1/053;

  • 国家 EP

  • 入库时间 2022-08-21 11:40:24

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