首页> 外国专利> Thin film filter, thin film filter substrate, thin film filter manufacturing method, thin film filter substrate manufacturing method, and MEMS microphone and MEMS microphone manufacturing method.

Thin film filter, thin film filter substrate, thin film filter manufacturing method, thin film filter substrate manufacturing method, and MEMS microphone and MEMS microphone manufacturing method.

机译:薄膜滤波器,薄膜滤波器基板,薄膜滤波器制造方法,薄膜滤波器基板制造方法以及MEMS麦克风和MEMS麦克风制造方法。

摘要

PROBLEM TO BE SOLVED: To provide a thin film filter, a thin film filter substrate, a thin film filter manufacturing method, a thin film filter substrate manufacturing method, and a MEMS having a structure in which the pore size is constant and the airflow passing through each hole is directed in a constant direction. Provided are a method for manufacturing a microphone and a MEMS microphone. A thin film filter substrate 2 has a thin film portion 16 having a film surface 16a and a back film surface 16b, and the thin film portion 16 has a plurality of through holes 15 penetrating from the film surface 16a to the back film surface 16b. An inner wall surface 38 with streaks having streaks 37 along the intersecting direction intersecting the film surface 16a is formed inside each through hole 15. [Selection diagram] Fig. 3
机译:解决的问题:提供一种具有孔径恒定且气流通过的结构的薄膜过滤器,薄膜过滤器基板,薄膜过滤器制造方法,薄膜过滤器基板制造方法以及MEMS。通过每个孔的方向是恒定的。提供了一种用于制造麦克风和MEMS麦克风的方法。薄膜过滤器基板2具有薄膜部分16,该薄膜部分16具有薄膜表面16a和后薄膜表面16b,并且薄膜部分16具有从薄膜表面16a穿透到后薄膜表面16b的多个通孔15。在各通孔15的内部形成有内壁表面38,该内壁表面38具有沿着与膜表面16a相交的方向上具有条纹37的条纹37。[选择图]图3

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