首页> 外国专利> FRAME-INTEGRATED TYPE VAPOR DEPOSITION MASK, PREPARATION BODY OF FRAME-INTEGRATED TYPE VAPOR DEPOSITION MASK, METHOD FOR FORMING VAPOR DEPOSITION PATTERN, MANUFACTURING METHOD FOR ORGANIC SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD FOR ORGANIC EL DISPLAY

FRAME-INTEGRATED TYPE VAPOR DEPOSITION MASK, PREPARATION BODY OF FRAME-INTEGRATED TYPE VAPOR DEPOSITION MASK, METHOD FOR FORMING VAPOR DEPOSITION PATTERN, MANUFACTURING METHOD FOR ORGANIC SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD FOR ORGANIC EL DISPLAY

机译:框型气相沉积面膜,框型气相沉积面膜的制备体,气相沉积图案的形成方法,有机半导体元件的制造方法以及有机EL显示器的制造方法

摘要

To provide a vapor deposition mask capable of forming a precise vapor deposition pattern.SOLUTION: A plurality of vapor deposition masks 100 include a resin mask 20 having resin mask openings 25 corresponding to a pattern to prepare vapor deposition. The resin mask is a quadrangle with a long side and a short side. The plurality of vapor deposition masks include isolated strip-shaped metal layers 10 that are positioned at both ends in a long side direction of the resin mask and along the short side of the resin mask on one face of the resin mask. The plurality of the vapor deposition masks are fixed to a frame at the strip-shaped metal layer along the short side and have a peripheral part in an area overlapping with the frame and a non-peripheral part in an area not overlapping with the frame in one face of the resin mask. With regard to a frame-integrated type vapor deposition mask, in at least one of the plurality of the vapor deposition masks, the strip-shaped metal layer along the short side of the resin mask extends over the peripheral part and the non-peripheral part, whereas all of one side of the short side forming the metal layer overlaps with the peripheral part.SELECTED DRAWING: Figure 1
机译:为了提供能够形成精确的气相沉积图案的气相沉积掩模。解决方案:多个气相沉积掩模100包括树脂掩模20,该树脂掩模20具有与用于制备气相沉积的图案相对应的树脂掩模开口25。树脂掩模是具有长边和短边的四边形。多个蒸镀掩模包括隔​​离的带状金属层10,其位于树脂掩模的长边方向的两端并且在树脂掩模的一个面上沿着树脂掩模的短边。多个蒸镀掩模沿着短边固定在带状金属层的框架上,并且在与框架重叠的区域中具有外围部分,并且在与框架不重叠的区域中具有非外围部分。树脂面膜的一面。关于框架一体型蒸镀掩模,在多个蒸镀掩模中的至少一者中,沿着树脂掩模的短边的带状金属层在周缘部和非周缘部上延伸。 ,而形成金属层的短边的一侧全部与外围部分重叠。图1

著录项

  • 公开/公告号JP2020073726A

    专利类型

  • 公开/公告日2020-05-14

    原文格式PDF

  • 申请/专利权人 DAINIPPON PRINTING CO LTD;

    申请/专利号JP20190234459

  • 发明设计人 OBATA KATSUYA;SONE YASUKO;HOKARI KUMIKO;

    申请日2019-12-25

  • 分类号C23C14/04;H05B33/10;H01L51/50;

  • 国家 JP

  • 入库时间 2022-08-21 11:37:25

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