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METHOD FOR MANUFACTURING GROUP III NITRIDE SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING GROUP III NITRIDE SINGLE CRYSTAL LAMINATE
METHOD FOR MANUFACTURING GROUP III NITRIDE SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING GROUP III NITRIDE SINGLE CRYSTAL LAMINATE
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机译:制造III族氮化物单晶层合物的方法和制造III族氮化物单晶层合物的方法
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摘要
To provide a method for manufacturing a high quality group III nitride single crystal substrate, capable of reducing a grain region having crystal orientation different from that of a peripheral single crystal region in the group III nitride single crystal substrate having the grain region.SOLUTION: The method for manufacturing a group III nitride single crystal substrate comprises: the first modification step of adding physical action to at least a part of grain region of the group III nitride single crystal substrate having the grain region having crystal orientation different from that of a peripheral single crystal region to change the crystal arrangement of the region; and the second modification step of further changing the crystal arrangement changed by the first modification step. The method for manufacturing a group III nitride single crystal laminate obtained by laminating a group III nitride single crystal layer on the group III nitride single crystal substrate obtained by the method is provided.SELECTED DRAWING: Figure 1
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