PRODUCTION METHOD OF SILICON FINE PARTICLE HAVING FINE PROTRUSION, AND SILICON FINE PARTICLE

摘要

To provide means for forming fine protrusions on a surface of a silicon fine particle by use of a simple operation and an inexpensive material.SOLUTION: Silicon fine particles are doped with phosphorus or boron by bringing phosphorus or a compound containing phosphorus or bringing boron or a compound containing boron into contact with silicon fine particles and then heat-treating the particles. After the above step, in the case of doping with phosphorus, a first etching step is performed, in which the silicon fine particles are immersed in a solution containing hydrofluoric acid and a transition metal ion so as to precipitate particles of the transition metal on the surfaces of the silicon fine particles, as well as to etch the surfaces of the silicon fine particles by the hydrofluoric acid, the surfaces where, resulting from the precipitation, a contact portion with the transition metal particles is oxidized, and then the transition metal particles are removed. In the case of doping with boron, the first etching step is performed in the same manner as in the case of doping with phosphorus, and then a second etching step is performed by using hydrofluoric acid and an oxidizing agent.SELECTED DRAWING: Figure 1