Sample supply device, inductively coupled plasma analysis system including the sample supply device, and sample supply method

摘要

PROBLEM TO BE SOLVED: To provide a sample supply device capable of stably allowing a sample to be measured to reach plasma. A sample supply including an introduction device 52 for intermittently introducing a sample S, and a plasma torch 24 for providing a plasma generation means 22 for generating a plasma P and for guiding the introduced sample S into a plasma P. In the apparatus 12, the introduction device 52 is provided above the plasma torch 24, and the plasma generation means 22 is provided below the plasma torch 24. [Selection diagram] Figure 1