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System, lithographic apparatus, and method for reducing oxidation or removing oxide on a substrate support
System, lithographic apparatus, and method for reducing oxidation or removing oxide on a substrate support
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机译:用于减少衬底支撑件上的氧化或去除氧化物的系统,光刻设备和方法
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摘要
Conductive to a substrate support configured to hold the substrate, a conductive or semi-conductive element that contacts the substrate support and covers at least a portion of the substrate support, and a portion of the substrate support that is covered by the conductive or semi-conductive element. Alternatively, a system comprising a charging device configured to apply a positive potential to a semi-conductive element. [Selection diagram]
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