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Compositional emission spectroscopy for the detection of particle-induced arcs in the manufacturing process
Compositional emission spectroscopy for the detection of particle-induced arcs in the manufacturing process
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机译:成分发射光谱法,用于检测制造过程中的颗粒感应电弧
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摘要
Described herein are architectures, platforms, and methods for detecting and analyzing anomalous events (ie, arc events) from spectral data collected during a wafer fabrication process.
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