首页> 外国专利> COATING SOLUTION FOR FORMING METAL OXIDE FILM, OXIDE INSULATOR FILM, FIELD EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM

COATING SOLUTION FOR FORMING METAL OXIDE FILM, OXIDE INSULATOR FILM, FIELD EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM

机译:用于形成金属氧化物膜,氧化物绝缘膜,场效应晶体管,显示元件,图像显示设备和系统的涂层解决方案

摘要

PROBLEM TO BE SOLVED: To provide a high-performance field-effect transistor using a high dielectric constant oxide insulator film as a gate insulating layer.;SOLUTION: A field effect transistor includes a source electrode, a drain electrode, a gate electrode, a semiconductor layer, and a gate insulating layer, and the gate insulating layer is an oxide insulator film including at least one element A selected from Zr and Hf and at least one element B selected from Be and Mg.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2020,JPO&INPIT
机译:要解决的问题:提供一种使用高介电常数氧化物绝缘膜作为栅极绝缘层的高性能场效应晶体管;解决方案:场效应晶体管包括源电极,漏电极,栅电极,半导体层,栅绝缘层和栅绝缘层是氧化物绝缘膜,包括至少一种选自Zr和Hf的元素A和至少一种选自Be和Mg的元素B。选图:图1;版权:(C)2020,JPO&INPIT

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