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Graphene-containing structures, semiconductor devices, and methods for manufacturing graphene-containing structures
Graphene-containing structures, semiconductor devices, and methods for manufacturing graphene-containing structures
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机译:含石墨烯的结构,半导体器件以及用于制造含石墨烯的结构的方法
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摘要
To provide a graphene-containing structure capable of enlarging graphene, mass-producing, and improving carrier mobility of graphene, a semiconductor device having high carrier mobility using the same, and a method for manufacturing a graphene-containing structure.SOLUTION: The graphene-containing structure includes: a silicon carbide semiconductor layer; a graphene layer on the silicon carbide semiconductor layer; and a first aluminum nitride layer provided between the silicon carbide semiconductor layer and the graphene layer.SELECTED DRAWING: Figure 1
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