The invention relates to a cobalt-chromium-platinum-boron-rhenium sputtering target material, a cobalt-chromium-platinum-boron-rhenium layer and a preparation method of the cobalt-chromium-platinum-boron-rhenium layer. The invention discloses a cobalt-chromium-platinum-boron-rhenium-containing sputtering target material. The total number of atoms is taken as a reference; the content of cobalt is greater than 50 atomic percent; the content of chromium is greater than or equal to 2 atomic percent and less than or equal to 18 atomic percent; wherein the content of platinum is greater than or equal to 9 atomic percent and less than or equal to 30 atomic percent, the content of boron is greater than or equal to 2 atomic percent and less than or equal to 14 atomic percent, and the content of rhenium is greater than or equal to 2 atomic percent and less than or equal to 8 atomic percent. By controlling the composition of the sputtering target material containing cobalt, chromium, platinum, boron and rhenium, the probability of flameout can be greatly reduced, and the stability during sputtering is improved.
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