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Basis weight measuring device and basis weight measuring method

机译:基重测量装置和基重测量方法

摘要

PROBLEM TO BE SOLVED: To provide a basis weight measuring device capable of measuring the basis weight of a measurement object with a relatively simple configuration. SOLUTION: This is a basis weight measuring device 1 for measuring the basis weight of an object to be measured, the substrate 110, the lens holder 120 arranged on the substrate 110, and the lens 130 arranged on the upper surface side of the lens holder 120. The light emitting element 140, the first light receiving element 151 that receives the first reflected light from the lens holder 120 with respect to the irradiation light of the light emitting element 140, and the second reflected light from the measurement object with respect to the irradiation light of the light emitting element 140. The second light receiving element 152 that receives the P wave component, the third light receiving element 153 that receives the S wave component of the second reflected light, and the P wave component and the S wave component of the second reflected light are subtracted from the first reflected light. It is characterized by including a measuring unit 200 for calculating pseudo-transmitted light of a measurement object and measuring the basis weight based on the pseudo-transmitted light. [Selection diagram] Fig. 1
机译:解决的问题:提供一种能够以相对简单的结构来测量被测量物的基重的基重测量装置。解决方案:这是用于测量被测物体,基板110,布置在基板110上的透镜架120和布置在透镜架上表面侧的透镜130的基重的基重测量装置1。 120.发光元件140,相对于发光元件140的照射光从透镜架120接收第一反射光的第一受光元件151,以及相对于发光元件140从测量对象接收的第二反射光。发光元件140的照射光。接收P波成分的第二受光元件152,接收第二反射光的S波成分的第三受光元件153,以及P波成分和S波从第一反射光中减去第二反射光的分量。其特征在于包括测量单元200,该测量单元200用于计算测量对象的伪透射光并基于伪透射光来测量基重。 [选择图]图1

著录项

  • 公开/公告号JP6761912B1

    专利类型

  • 公开/公告日2020-09-30

    原文格式PDF

  • 申请/专利权人 ニチコン株式会社;

    申请/专利号JP20200031202

  • 发明设计人 森田 千晴;本田 一真;

    申请日2020-02-27

  • 分类号G01N21/21;B65H7/14;G03G21;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:37

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