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Device for monitoring radiation source, radiation source, method for monitoring radiation source, device manufacturing method
Device for monitoring radiation source, radiation source, method for monitoring radiation source, device manufacturing method
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机译:辐射源监控装置,辐射源,辐射源监控方法,装置制造方法
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摘要
Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
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