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Pretreatment liquid for electrolytic copper plating and electrolytic copper plating method

机译:电解镀铜预处理液及电解镀铜方法

摘要

PROBLEM TO BE SOLVED: To provide a technique, regarding the pretreatment of copper electroplating, imparting excellent appearance to the obtained copper film and satisfactorily copper-filling a via hole.SOLUTION: Provided is a pretreatment liquid for copper electroplating containing the alkylene oxide-added matter of alkanediol represented in the (1), where, by performing copper electroplating after the object to be plated is treated, oil components are satisfactorily removed to attain copper filling causing no generation of unevenness in cloud in an electric phonograph film, and further attaining smooth copper filling even in a via hole having a high aspect ratio: H-(OA)m-O-R-O-(AO)n-H (1) ( A denotes 2 to 4C alkylene; n denotes an integer of 1 to 20; and R denotes a 3 to 20C alkylene chain).SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种技术,用于电镀铜的预处理,使所得的铜膜具有优异的外观,并令人满意地填充通孔的铜。解决方案:提供一种用于电镀铜的预处理液,其中含有添加的环氧烷烃(1)中表示的链烷二醇的物质,其中,在对被镀物进行处理之后,通过进行镀铜,将油成分令人满意地除去,从而使铜填充,从而不会在电唱机薄膜中产生白浊,进而得到。 H-(OA)mORO-(AO)nH(1)(A表示2至4C亚烷基; n表示1至20的整数; R表示3到20C亚烷基链)。

著录项

  • 公开/公告号JP6612525B2

    专利类型

  • 公开/公告日2019-11-27

    原文格式PDF

  • 申请/专利权人 石原ケミカル株式会社;

    申请/专利号JP20150098563

  • 发明设计人 藤原 雅宏;榮川 昌宏;

    申请日2015-05-13

  • 分类号C25D5/34;C25D7;C23G5/032;H05K3/40;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:19

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