首页>
外国专利>
Methods and equipment for determining patterning process parameters
Methods and equipment for determining patterning process parameters
展开▼
机译:确定图案化工艺参数的方法和设备
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method of determining overlay of a patterning process, the method including: illuminating a substrate with a radiation beam such that a beam spot on the substrate is filled with one or more physical instances of a unit cell, the unit cell having geometric symmetry at a nominal value of overlay; detecting primarily zeroth order radiation redirected by the one or more physical instances of the unit cell using a detector; and determining, by a hardware computer system, a non-nominal value of overlay of the unit cell from values of an optical characteristic of the detected radiation.
展开▼