An object of the present invention is to reduce particles generated in sputtering, and in order to achieve such an object, there is provided a sputtering target material including in at.%: 10 to 50% of B; and the balance of at least one of Co and Fe, and unavoidable impurities, in which the intensity ratio [I [(CoFe) 3 B]/I [(CoFe) 2 B]] of the X-ray diffraction intensity [I [(CoFe) 3 B]] of (CoFe) 3 B (121) to the X-ray diffraction intensity [I [(CoFe) 2 B]] of (CoFe) 2 B (200), the intensity ratio [I (Co 3 B)/I (Co 2 B)] of the X-ray diffraction intensity [I (Co 3 B)] of Co 3 B (121) to the X-ray diffraction intensity [I (Co 2 B)] of Co 2 B (200), or the intensity ratio [I (Fe 3 B)/I (Fe 2 B)] of the X-ray diffraction intensity [I (Fe 3 B)] of Fe 3 B (121) to the X-ray diffraction intensity [I (Fe 2 B)] of Fe 2 B (200) is 1.50 or less.
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