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BACKGROUND ELIMINATION METHOD AND X-RAY FLUORESCENCE SPECTROMETER

机译:背景消除方法和X射线荧光光谱仪

摘要

To estimate accurate background intensity and perform accurate microanalysis even when a background shape near a peak is curved.SOLUTION: With respect to a secondary X-ray generated from a preliminary sample, the present invention acquires three preliminary intensities at a peak angle corresponding to an analysis element and a first and a second background angle, calculates two kinds of background rejection coefficient on the basis of the three preliminary intensities in accordance with a presumption that the shape of a background profile is constituted from an element whose shape is analogous between samples, an element whose intensity is constant at angles and two background elements, irradiates an analysis sample with a primary X-ray and obtains three analytical intensities of a secondary X-ray at the peak angle and the first and second background angles, and subtracts the background intensity at the peak angle having been calculated from the two kinds of background rejection coefficient and the analytical intensity at the first and second background angles from the analytical intensity at the peak angle.SELECTED DRAWING: Figure 3
机译:为了估计准确的背景强度并即使在峰附近的背景形状弯曲时也能进行准确的微量分析。解决方案:对于从初步样品产生的二次X射线,本发明在对应于样品的峰角处获得三个初步强度。分析元素以及第一和第二背景角度,根据三个初步强度,根据假设背景轮廓的形状由样品之间的形状相似的元素构成的背景,计算两种背景排斥系数,一个强度在一个角度上恒定的元素和两个背景元素,用一次X射线照射分析样品,并在峰值角度和第一个和第二个背景角度获得二次X射线的三个分析强度,然后减去背景根据两种背景抑制系数计算出峰角处的强度从峰角处的分析强度得到的有效和分析强度。选图:图3

著录项

  • 公开/公告号JP2020003331A

    专利类型

  • 公开/公告日2020-01-09

    原文格式PDF

  • 申请/专利权人 RIGAKU CORP;

    申请/专利号JP20180122759

  • 发明设计人 KATAOKA YOSHIYUKI;MORIYAMA TAKAO;

    申请日2018-06-28

  • 分类号G01N23/223;

  • 国家 JP

  • 入库时间 2022-08-21 11:31:57

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