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Method for producing heterocycle-containing polymer precursor, heterocycle-containing polymer precursor, and application thereof

机译:含杂环的聚合物前体的制备方法,含杂环的聚合物前体及其应用

摘要

There are provided a method of manufacturing a heterocycle-containing polymer precursor having a fast cyclization rate, a heterocycle-containing polymer precursor, a composition, a cured film, a method of manufacturing a cured film, and a semiconductor device. There is provided a method of manufacturing a heterocycle-containing polymer precursor using dicarboxylic acid or dicarboxylic acid derivative and diamine as raw materials, including: halogenating the dicarboxylic acid or the dicarboxylic acid derivative by using a halogenating agent and performing reaction with diamine; and adjusting a difference between a molar amount of the halogenating agent and a molar amount of water included in a reaction system before reaction of the halogenating agent to become 2.10 times or less of a total molar amount of the dicarboxylic acid and the dicarboxylic acid derivative as the raw materials.
机译:提供了一种具有快速环化率的含杂环的聚合物前体的制造方法,含杂环的聚合物前体,组合物,固化膜,固化膜的制造方法以及半导体装置。本发明提供了一种以二羧酸或二羧酸衍生物和二胺为原料制造含杂环的聚合物前体的方法,该方法包括:使用卤化剂将二羧酸或二羧酸衍生物卤化并与二胺反应;将卤化剂的反应前的卤化剂的摩尔量与反应体系中所含的水的摩尔量之差调整为二羧酸和二羧酸衍生物的总摩尔量的2.10倍以下。原材料。

著录项

  • 公开/公告号JP6616844B2

    专利类型

  • 公开/公告日2019-12-04

    原文格式PDF

  • 申请/专利权人 富士フイルム株式会社;

    申请/专利号JP20170556074

  • 发明设计人 川端 健志;岩井 悠;渋谷 明規;

    申请日2016-12-13

  • 分类号C08G73/10;C08G73/22;C09D179/08;C09D179/04;H01B3/22;H01L21/312;

  • 国家 JP

  • 入库时间 2022-08-21 11:31:57

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